价格:未填

发送询价

MicroLine 300
关键尺寸的自动化光学测量系统

MicroLineTM 300是一款高性能测量晶圆、光罩、MEMS和其他微加工设备等关键尺寸的自动化测量系统。该系统配备了高质量光学显微镜和移动平台，可对200mm的晶圆上0.5μm到400μm的特征尺寸进行全自动的视场测量。

• 200 x 200mmX-Y平台
• 基于视觉的自动聚焦获得影像质量
• 自动照明可编程光强
• 用于测量透明层、不规则边缘的线、厚膜等的强劲性能
• 完全可编程的序列，包括自动聚焦和关键尺寸测量
• 电动的6目物镜转换器，软件控制
• 可选的透射照明

技术规格：
- 测量行程: 200 x 200 x 25mm (XYZ)
- 平台运行: 交叉滚轴手动同轴定位和快速释放
- 视场内的测量精度: 0.010μm (用100物镜)
- 特征尺寸: 视场内0.5μm - 400μm
- FOV测量重复性: <0.010μm on wafers (用100物镜)
<0.005μm on photomasks (用100物镜)
- 照明: 石英卤素灯, 反射光
自动照明
- 低噪音CCD VGA格式摄像头
- 图像处理60帧每秒

MicroLine 300的典型应用包括：

• 晶圆
• 光罩
• MEMS
• 微型组件

测量类型:

• 关键尺寸:

线宽 Linewidth
节距 Pitch
间隙 Spacing

• Overlay

Multi-layer registration
Box in box
Circle
Edge roughness
Butting error

MicroLine 300
Automated Optical Critical Dimension Metrology System

The MicroLineTM 300 is a high-performance Critical Dimension Measurement System for wafers, masks, MEMS, and other micro-fabricated devices. This capable instrument provides precise automated field-of-view measurement of features ranging in size from 0.5μm to 400μm on wafers up to 200mm.

• 200 x 200mm Precision X-Y stage
• Vision-based autofocus for Optimum image quality
• Autoillumination Programmable light intensity
• Robust capacities for measuring transparent Layers, lines with irregular edges, thick films and more
• Fully Programmable Sequences including autofocus and Critical Dimension Measurement
• Motorized 6-Objective nosepiece with software control
• Optional transmitted illumination

Technical Specification
- Stage Travel: 200 x 200 x 25mm (XYZ)
- Stage Type: crossed-roller with manual co-axial positioning and quick release
- Measurement Accuracy in the field of view: 0.010μm (with 100 objective lens)
- Feature size: 0.5μm - 400μm within the field of view
- FOV Measurement repeatability: <0.010μm on wafers (with 100 objective lens)
<0.005μm on photomasks (with 100 objective lens)
- Illumination: Quartz-halogen, reflected light
Autoillumination
- Low-noise CCD VGA format camera
- Image processing at 60 frames per second

Typical Applications for MicroLine 300 include:

• Wafers
• Photomasks
• MEMS
• Micro-scale components

Measurement Types:

• Critical Dimensions:

Linewidth
Pitch
Spacing

• Overlay

Multi-layer registration
Box in box
Circle
Edge roughness
Butting error